Interdisziplinäres Zentrum für Materialwissenschaften
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      Nanotechnikum
Martin-Luther-Universität
Interdisziplinäres Zentrum für Materialwissenschaften
Nanotechnikum Weinberg
Heinrich-Damerow-Str. 4,
D-06120 Halle, Germany
Tel.: +49 345 55 28471
Telefax:+49 345 55 27390 email: info@cmat.uni-halle.de
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abstract H.S. Leipner, N. Geyer, F. Syrowatka, H. Cheng, B. Fuhrmann
Fabrication of complex structures with an array of nanopinhole cameras.
Proc. SPIE 8102 (2011), 81020W
 
abstractC. Khare, B. Fuhrmann, H. S. Leipner, J. Bauer, B. Rauschenbach
Optimized growth of Ge nanorod arrays on Si patterns.
.J Vac. Sci. Technol. A 29 (2011), 051501
 
abstractX. Ou, N. Geyer, R. Kögler, P. Werner, W. Skorupa
Acceptor deactivation in individual silicon nanowires: From thick to ultrathin.
Appl. Phys. Lett. 98 (2011), 253103
 
unfortunately no abstract available M. Niepel, B. Fuhrmann, H. S. Leipner, T. Groth
Multischichten aus synthetischen und Biopolymeren steuern die Zelladhäsion auf nanostrukturierten Oberflächen.
Biomater. 12 (1-4) (2011), 143
 
unfortunately no abstract available S. Hollstein, E. Hoffmann, J. Vogel, F. Heyroth, N. Prochnow, P. Maurer
Micromorphometrical analyses of five different ultrasonic osteotomy devices at the rabbit skull.
Clin. Oral Implants Res. 22, 5 (2011),
 
abstractChristoph Pientschke, Ralf Steinhausen, Sabine Kern, Horst Beige
Modelling of the measured longitudinal piezoelectric coefficient of single ceramic fibres with annular electrodes.
Smart Mater. Struct. 20, 5 (2011), 2011
 
abstractOtwin Breitenstein, Hartmut S. Leipner, Peter Werner (Ed.)
10th International workshop Beam injection Assessment of microstructures in semiconductors.
(2011),
 
unfortunately no abstract available Otwin Breitenstein, Hartmut S. Leipner
Preface.
phys. stat. sol. (c) 8, 4 (2011), A7
 
abstractI. Ratschinski, H. S. Leipner, F. Heyroth, W. Fränzel, R. Hammer, M. Jurisch
Dislocations and cracks at Vickers indentations in GaN and GaAs bulk crystals.
phys. stat. sol. (c) 8, 4 (2011), 1325-1329
 
abstractZhipeng Huang, Nadine Geyer, Peter Werner, Johannes de Boor, Ulrich Gösele
Metal-assisted chemical etching of silicon: A review.
Adv. Mater. 23 (2011), 285-308
 
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