Interdisziplinäres Zentrum für Materialwissenschaften
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Interdisziplinäres Zentrum für Materialwissenschaften
Nanotechnikum Weinberg
Heinrich-Damerow-Str. 4,
D-06120 Halle, Germany
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Martin Schade, Nadine Geyer, Bodo Fuhrmann, Frank Heyroth, Hartmut S. Leipner
High-resolution analytical electron microscopy of catalytically etched silicon nanowires
Appl. Phys. A 95 (2009), 325-327

We report on the characterization of hexagonally ordered, vertically aligned silicon nanowires (SiNW) by means of analytical transmission electron microscopy. Combining colloidal lithography, plasma etching, and catalytic wet etching arrays of SiNW of a sub-50 nm diameter with an aspect ratio of up to 10 could be fabricated. Scanning transmission electron microscopy has been applied in order to investigate the morphology, the internal structure, and the composition of the catalytically etched SiNW. The analysis yielded a single-crystalline porous structure composed of crystalline silicon, amorphous silicon, and SiOx with x <= 2.

Keywords: HREM, analytical electron microscopy, transmission electron microscopy, silicon, nanowires, lithography, preparation, etch, metal, silver, scanning electron microscopy, porous, SiO2, EELS
© Springer 2009

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