In addition to the classic lithography methods such as electron beam or photolithography in this lab area, among others alternative nanolithography processes such as laser interference lithography or imprint lithography for the production of regular, laterally structured functional layers with structure sizes <100 nm for a wide variety of applications have also been developed. In addition to the lithography process itself, a number of upstream and downstream processes, such as cleaning, coating, electron beam vapor deposition in a high vacuum, thermal treatment, as well as wet and dry etching processes under clean room conditions, are available.

The following examination techniques and devices are available:

contact: Dr. Bodo Fuhrmann