A method which combines colloidal lithography with the principle of a pinhole camera is presented for the fabrication of well-ordered arrays of complex structures. By using atomic beams, it is possible to overcome the diffraction limit of light for apertures with nanometer dimensions. There are no geometrical or chromatic aberrations, since no refracting elements exist. Limitations due to the finite size of the nanopinholes, which lead to a certain blurring of the replica, are discussed.